Practical Considerations

An Oblon blog on protecting and enforcing industrial design rights.

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Design Patents
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Design Day 2015
Recap of USPTO's Design Day 2016

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About Us

Philippe J.C. Signore, Ph.D.
Andrew M. Ollis
Colin B. Harris
David. M. Longo, Ph.D.
Patrick L. Miller

Samsung Fashion Designs Patent Infringement Obviousness SCOTUS Conferences False Marking Egyptian Goddess Prosecution Written Description Injunction PTAB Practical Considerations CFR International and Non-U.S. Design Law and Practice Unfair Competition USPTO Post-grant Review Filings and Decisions ITC Utility Patents District Court Trade Dress Design Patents GUI Copyright Design Day CAFC Geneva Act Hague Agreement Invalidation bmw Legislation Apple AIA Community Designs litigation Policy and Rules Federal Circuit Complaint Trademark

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Recent Posts

Recap of USPTO's Design Day 2017
Design Patents Remain a Valuable Part of a Patent Portfolio after Samsung v. Apple
Supreme Court Overturns Apple's $399MM Design Patent Infringement Award Against Samsung
Justices Seem Unsatisfied With Design Patent Damages Tests
ITC Terminates Design Patent-Based 337 Investigation

Links & Resources

USPTO Design Application Filing Guide
Hague System for the International Registration of Industrial Designs
OHIM - Designs
Oblon Design Rights 101

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Copyright © 2017 Oblon, McClelland, Maier & Neustadt, L.L.P. | Disclaimer

Oblon Spivak

The opinions, commentary and characterizations provided to this online forum by the authors and moderators are provided for encouraging discussion, thought and debate on important design patent issues. These postings are in no way representative of the opinions of the Oblon firm, or its clients, but rather the personal views of the individual authors.